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Aug 01, 2007 at 05:59 PM |
 Photronics has said that revenues from photomasks for its forthcoming financial quarter will be lower than expected due to flat panel display (FPD) customers focusing on cost reductions rather than on new product introductions and ‘strategic realignment activities among various alliance partners in Europe.'Write Comment (0 comments) |
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Jul 23, 2007 at 04:44 PM |
 ASML has shipped its first TWINSCAN XT:1900i (NA of 1.35) immersion lithography tool believed to be to a major NAND flash memory manufacturer that will be used for volume production at the 56nm node and below the capability of imaging features down to 36.5nm. The company claims that multiple system orders for the new tool have been placed with many shipped before the end of this year. ASML announced the news during SEMICON West, last week.
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Jul 18, 2007 at 09:01 AM |
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 By Dr Mike Cooke
Companies working with litho tool maker ASML report deals that are designed to push litho capabilities. Lens manufacturer Carl Zeiss SMT has produced a high numerical aperture (NA) lens that would take 248nm KrF lithography down to 80nm. At the same time, litho light source producer Cymer will be providing extreme ultraviolet (EUV) radiation systems.
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Jul 12, 2007 at 02:42 PM |
 Cadence Design Systems has acquired Invarium, a DFM pattern synthesis specialist, for an undisclosed amount. The acquisition is seen as a further move by major EDA companies to boost their DFM offerings for designs targeted at the 45nm node and below.
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Jul 11, 2007 at 04:45 PM |
 Cadence Design Systems follows a long line of EDA and DFM companies collaborating with Japan's Semiconductor Technology Academic Research Center (STARC) member companies. The design company has employed an advanced design flow to improve manufacturability and yield for 65nm designs developed at STARC. Cadence said they have been collaborating with STARC for over 15 months to provide member companies with a new set of DFM capabilities.
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Jul 11, 2007 at 04:02 PM |
 Applied Ventures, the venture capital arm of Applied Materials, has invested in a company called Semprius that is developing a novel transfer printing technology using single crystal semiconductors on any substrate, including glass, plastic and other semiconductor materials.
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Jul 03, 2007 at 03:16 PM |
 X-FAB Silicon Foundries has awarded Toppan Photomasks with its "Supplier of the Year" Award for 2006. The award is only given to one supplier each year based on consistency of superior technology as well as quality, service, strategic support, operations support and price.
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Jun 29, 2007 at 02:33 PM |
 Micron Technology executives said during the company's third quarter conference call that they believed memory capacity additions in both DRAM and NAND flash markets were slowing, while demand had remained strong in the last quarter with a seasonal demand boost looming.
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Jun 29, 2007 at 11:14 AM |
 Gigaphoton has said it has achieved a new milestone with the installation of its 500th excimer laser light source that was achieved with Samsung Electronics. Samsung had installed Gigaphoton's GT40A laser system to work with a 193nm ArF lithography tool. The company reported that it has installed more than 100 lasers in the last 12 months and claims a 30 percent market share based on sales revenue in 2006.
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Jun 26, 2007 at 04:24 PM |
 To remain competitive in the fast-paced world of lithography materials technology, Rohm and Haas Electronic Materials has said that it will invest US$60 million in leading-edge lithography equipment including ASML's latest immersion lithography tool, the TWINSCAN XT: 1900Gi, to support photoresist and anti-reflective coatings development.
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Lithography 
