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Feb 04, 2005 at 12:00 PM |
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Adetailed review of the status of high power EUV plasma sources for
semiconductor manufacturing has been published in Volume 37 Issue 23 of
Journal of Physics D: Applied Physics (J. Phys. D).Write Comment (0 comments) |
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Feb 04, 2005 at 11:00 AM |
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Molecular Imprints, Inc. (MII) has completed an exclusive licensing
agreement with the Massachusetts Institute of Technology (MIT) for the
use of the university's moiré fringe alignment technology, in MII's
Step and Flash Imprint Lithography " S-FIL" systems.Write Comment (0 comments) |
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Feb 04, 2005 at 10:00 AM |
A SEMATECH- led steering commitee has ranked the critical issues for
bringing maskless lithography (ML2) from R&D concepts to limited
commercial production, possibly within the decade. "The cost of
developing mask sets for leading-edge litho applications are becoming a
growing concern for many IC manufaturers" said Walt Trybula, SEMATEH
Senior Fellow and meeting organizer. "Clearly, maskless lithography is
a potential solution for the mask cost issue."
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Feb 04, 2005 at 09:00 AM |
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Innos Ltd, a UK based IC research and development company has added the
Nikon NSR-2005/i9C ‘step-and-repeat system' to its cleanroom. In the
past six months, Innos has invested heavily in its lithography
capabilities including the installation of the UK's irst JBX-9300FS
electron-beam lithography system in June. It now boasts high volume
wafer throughput, with photolithography capabilities down to 10nm.Write Comment (0 comments) |
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Feb 04, 2005 at 08:00 AM |
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ASML now has four Japanese customers after it announced that Matsushita
Electric Industrial has placed an order (July 2004), for its TWINSCAN
lithography system for its 300mm fab based in Uozu, Japan.Write Comment (0 comments) |
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Feb 04, 2005 at 07:00 AM |
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Silicon Valley Technology Center (SVTC), a division of Cypress
Semiconductor Corp. has become the first R&D services provider
offering 65nm silicon processing capabilities to thirdparty companies
with the installation of a new 200- and 300-mm wafer photolithography
tool from ASML.Write Comment (0 comments) |
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Feb 04, 2005 at 06:00 AM |
Coherent, Inc. announced that its Lambda Physik subsidiary would
discontinue future product development and investments in the
semiconductor lithography market. Lambda will continue to support its
installed lithography base.
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Feb 04, 2005 at 05:00 AM |
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Extraction received an order for multiple TMB-193 real-time total
molecular base monitors from a leading semiconductor producer in Japan.
The customer chose the TMB-193 systems to support its need to
continuously monitor for molecular ontamination in 193nm lithography
tools and production areas.Write Comment (0 comments) |
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Feb 04, 2005 at 04:00 AM |
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Dainippon Screen (DNS) has installed its latest 300mm coat and develop
system, the RF 3 in the Nikon lab. The track system is to be integrated
with Nikon's NSR-S307E high-NA ArF Scanner as part of agreement to
extend R&D activities for the 65nm node as well as develop improved
process capabilities.Write Comment (0 comments) |
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| Results 225 - 233 of 233 |
Lithography 
