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Dec 14, 2005 at 04:38 PM |
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Semiconductor
Manufacturing International Corporation (has entered into a long-term loan
facility agreement with ABN AMRO Bank N.V. and Commerz bank (Nederland) N.V. to
the tune of 85 million euros. SMIC stated that the funds would be used to
purchase lithography tools. ASML is SMIC's lithography tool supplier.Write Comment (0 comments) |
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Dec 13, 2005 at 01:01 AM |
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Tokyo
Electron has extended research into advanced lithography technologies with IMEC
as part of IMEC's Industrial Affiliation Program on EUV lithography. TEL will
provide a new photoresist coater/developer tool in January 2006 with the
program expected to run for three years.Write Comment (0 comments) |
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Dec 09, 2005 at 02:12 PM |
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XTREME technologies GmbH as part of a EU funded project to develop a light source for EUV lithography has claimed a proof-of-principle experiment that has taken light source wattage from 120 to 800 watts. The general perceived target for EUVL to become a mainstream manufacturing image technology is around 1 kilowatt.Write Comment (0 comments) |
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Dec 07, 2005 at 03:52 PM |
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By Dr Mike Cooke Photronics is in talks with Micron Technology to jointly develop advanced reticle technologies for the 45nm node. The work would focus on mask technology for both bit cell and logic applications starting at the ITRS 45nm logic node. Write Comment (0 comments) |
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Dec 02, 2005 at 04:46 PM |
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The Advanced Mask Technology Center (AMTC) based in Dresden,
Germany has shipped the first EUV masks for ASML's EUV alpha tool, highlighting
the latest milestone in developing the infrastructure for the possible adoption
of the lithography technology for designs at 32nm half-pitch dimensions in the
2010-2012 timeframe.Write Comment (0 comments) |
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Nov 28, 2005 at 07:25 PM |
Nankai University Center for Optics Research, located in Tianjin, China has purchased a
DWL66 maskless lithography system from Heidelberg Instruments. The
DWL66 is capable of producing patterns down to 0.6 microns, and is
equipped with the capability of thick resist and grey scale exposure,
in addition to metrology, front to backside and layer to layer
alignment.Write Comment (0 comments) |
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Nov 21, 2005 at 04:13 PM |
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Semiconductor Manufacturing International Corp (SMIC) has been granted an 85 million Euro loan from an unidentified European bank, according to news reports from Hong Kong and mainland China.Write Comment (0 comments) |
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Nov 09, 2005 at 06:43 PM |
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Cymer highlighted during its annual analyst day conference
yesterday that immersion specific ArF laser light source sales would increase
dramatically in 2006 and 2007. The company also announced yesterday that it had
shipped its first XLA 300, the
world's first 6kiloHertz (kHz), 193nm, argon fluoride (ArF) light source,
specifically designed for immersion lithography tools.Write Comment (0 comments) |
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Nov 09, 2005 at 01:50 PM |
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Cymer, Inc has
shipped the first 6kiloHertz (kHz), 193nm, argon fluoride (ArF) light source
intended for immersion lithography production tools to an unspecified customer,
according to the company.Write Comment (0 comments) |
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Nov 03, 2005 at 04:43 PM |
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Advance
Reproductions Corp, a photomask manufacturer in North Andover, Mass has placed
a repeat order with Micronic Laser Systems AB for its MP80-series laser pattern
generator. This is the third purchase of a Micronic laser pattern generator for
Advance Reproductions since 1997, according to Micronic.Write Comment (0 comments) |
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| Results 197 - 210 of 243 |
Lithography 
