|
Jan 30, 2006 at 08:50 AM |
 Intel Corporation has via its venture
capital arm invested an undisclosed sum in XTREME technologies GmbH a joint
venture between JENOPTIK AG and USHIO Inc to boost the development cycle of its
13.5nm light source.Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 27, 2006 at 10:15 PM |
 IBM has acquired Inficon's advanced process
control software IP for advanced lithography tool applications. The technology
was originally developed by New Vision Systems, which was acquired by Inficon
in 2003. IBM and Intel had both been users of the software.Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 27, 2006 at 02:19 PM |
|
 A leading memory-device manufacturer has placed a large order with Cymer to replace competitors 27 incumbent laser light systems currently in volume production use. The program to replace the systems is expected to start in the first quarter 06 and take the duration of the year to complete, so that production is not disrupted.
Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 18, 2006 at 04:47 PM |
 ASML highlighted during a press and analyst conference call
today that covered the company's fourth quarter financial results that it could
eventually ship more immersion tools than the guidance given.Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 10, 2006 at 04:00 PM |
TOK America has selected the MC600 defect inspection tool from Sela to
provide "tool matching" analysis on photoresist samples to customers.
The tool has already been delivered to the TOK America facility in
Hillsboro, Oregon.
Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 10, 2006 at 02:45 PM |
Photronics has said it is in the final stages of the site selection
process for a new photomask fabrication facility in Korea that will
produce masks for the 65nm, 45nm and 32nm nodes in the second half of
2007.
Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 09, 2006 at 06:39 PM |
|
Toshiba
Corporation Semiconductor Company, has deployed SOLID+, a patented
micro-lithography lithography simulation/image verification tool for DFM
applications from SIGMA-C Software AG.Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 09, 2006 at 06:19 PM |
|
AMD has selected and deployed Accent Optical
Technologies "Caliper élan" 300mm overlay tool in AMD's new Fab 36 production
facility in Dresden, Germany. The tool will be used for both 90nm and 65nm
tool-to-tool matching applications for the Athlon 64 and next generation
devices. Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 06, 2006 at 07:20 PM |
The recently formed
NAND Flash joint venture IM Flash Technologies, between Intel Corp and Micron
Technology Inc., is expected to order all lithography tool requirements that
include critical and non-critical imaging layers from ASML, according to a
research note issued today by Titus Menzies, a financial analyst with Jeffries
International, based in London England.
Write Comment (0 comments) |
|
Read more...
|
|
|
Jan 03, 2006 at 05:41 PM |
|
The University of Massachusetts Amherst has ordered an "Imprio" 55 Step
and Flash nano-imprint lithography instrument from Molecular Imprints,
Inc as part of a new nano-lab being established at the campus. Delivery
and installation of the new equipment is expected by spring 2006.Write Comment (0 comments) |
|
Read more...
|
|
|
|
<< Start < Previous 11 12 13 14 15 16 17 18 Next > End >>
|
| Results 183 - 196 of 243 |
Lithography 
