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May 26, 2006 at 11:43 AM |
 The most recent SEMATECH-led Litho Forum, an invite only event for around 100 of the top lithography experts in the semiconductor industry are reported to have confirmed that they expect 193nm ArF immersion lithography to pattern critical layers at the 45nm half-pitch node in 2009 as well as continue at the 32nm half-pitch 2012.Write Comment (0 comments) |
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May 25, 2006 at 05:16 PM |
 SEMATECH assignees are to collaborate with the University of Queensland, Australia on a new project to seek out new high-refractive-index polymers for 193nm photoresists in an effort to extend immersion lithography to the 32nm node.Write Comment (0 comments) |
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May 23, 2006 at 10:24 AM |
 Update:ASML has increased its bookings guidance for its 2Q06 by at least 40 percent compared to 1Q06. Bookings for the last quarter reached 62 lithography tools meaning the company now expects to book around 87 tool orders in the current quarter.Write Comment (0 comments) |
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May 15, 2006 at 02:11 PM |
 Taiwan Semiconductor Manufacturing Company (TSMC) has assembled a 65nm DFM Compliance Design Support Ecosystem that is intended to enable IC designers to use the same DFM data file irrespective of the tool or vendor.
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May 15, 2006 at 01:43 PM |
 Nikon has revealed that it is projecting to investors that it will sell nine 193nmArF immersion tools in its coming financial year. Overall Nikon is projecting new lithography tool unit sales will top 170, up from 159 for the financial year just finished.
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May 15, 2006 at 11:50 AM |
 Applied Materials and Dainippon Screen Mfg Co., (DNS) have formed a joint venture company that will be dedicated to photoresist track develop processes and tools. The JV will be called Sokudo Co., Ltd with DNS owning 52 percent and Materials owning 48 percent. The company will be headquartered in Kyoto, Japan.Write Comment (0 comments) |
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May 08, 2006 at 02:52 PM |
 Photronics and Micron Technology have formed a new Joint Venture (JV) business called MP Mask Technology Center, LLC to develop and manufacture Micron's range of products as well as allow Photronics to leverage its investment for use by other customers. Micron will own 50.01 percent of the new JV, while Photronics will own 49.99 percent of the new enterprise.Write Comment (0 comments) |
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Apr 20, 2006 at 07:42 AM |
 ASML has stated that it expects to have shipped 70 193nm ArF immersion lithography tools by the end of 2007, giving the company around a 70 percent market share in the technology, according to Eric Maurice, President and CEO of ASML, during a conference call with financial analysts to discuss 1Q06 results.Write Comment (0 comments) |
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Apr 18, 2006 at 11:56 AM |
 Renesas Technology Corp has ordered multiple ‘Tachyon' RDI lithography simulation and design inspection systems from Brion Technologies as part of its strategy to introduce IC devices at the 65nm node in faster time-to-production than previous nodes.Write Comment (0 comments) |
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Apr 18, 2006 at 10:12 AM |
 Sony Corporation has adopted Synopsys' alternating aperture phase-shift mask (AA-PSM) technology to enhance manufacturability of its advanced logic chips that includes the ramp of the ‘Cell' microprocessor that will be used in the PS3 gaming console.Write Comment (0 comments) |
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Lithography 
