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Sep 19, 2006 at 01:14 PM |
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 Matsushita Electric Industrial Co has selected
Mentor Graphics' ‘Calibre' OPCverify tool for RET verification of masks used
for production at the 65nm node.
"Verification of post-OPC output is
critical to minimizing mask respins of million dollar mask sets, and avoiding
time-to-market delays," said Hiroyuki Tsujikawa, Semiconductor Company,
Matsushita Electric Industrial Co., Ltd.
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Sep 15, 2006 at 11:38 AM |
 Fujitsu Limited and Advantest Corporation are planning to form a Joint Venture prototype foundry shuttle service that will initially offer 65nm processes from Fujitsu and use Electron Beam Direct Write (EBDW) lithography developed and manufactured by Advantest in the second quarter of 2007.Write Comment (0 comments) |
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Sep 06, 2006 at 02:06 PM |
 Within the European Commission funded research project ‘More Moore' that is looking at a range of EUVL challenges a small team of scientist from Focus GmbH and two German universities, Bielefeld and Mainz have announced that they have been able to identify buried defects as small as 50nm under the multilayer coating of an EUV mask blank.
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Sep 06, 2006 at 12:59 PM |
 ASML has announced that orders from both NAND Flash and DRAM chip manufacturers in the current quarter have significantly boosted the lithography tool supplier's unit bookings for its 3Q06 financial quarter than previously guided. ASML expects orders to come in at around 93 units, similar to the Q2 order intake level that had also been revised upwards from previous guidance.
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Aug 30, 2006 at 02:06 PM |
 Two major R&D facilities, CNSE's Albany NanoTech in New York State and IMEC of Belgium have received delivery of the first two first ‘full field' EUV lithography systems designed and built by ASML.Write Comment (0 comments) |
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Aug 23, 2006 at 01:06 PM |
 X-FAB Semiconductor Foundries AG is implementing Cadence Design Systems' Virtuoso NeoCircuit DFM solution to identify and eliminate yield-related problems early in the design phase and fabrication process of its analog and mixed-signal IP cores, according to the company.Write Comment (0 comments) |
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Aug 17, 2006 at 04:47 PM |
 Obducat AB has announced that it has received notification from the US Patent Office that it will be issued with a new patent for its nano imprint lithography processes concerning non-stick and particle repelling coating materials.Write Comment (0 comments) |
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Aug 16, 2006 at 06:10 PM |
 Synopsys has confirmed that it has acquired lithography modeling specialist SIGMA-C in a $20.5 million all cash transaction. The acquisition is intended to boost Synopsys Design for Manufacturing (DFM) software portfolio while enabling closer modeling to actual manufacturing layouts of critical lithography steps.Write Comment (0 comments) |
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Aug 09, 2006 at 02:58 PM |
 By Dr Mike Cooke
Dainippon Printing (DNP) and Brion Technologies have started a joint development program to improve the productivity and quality of leading-edge photomask production. This program involves the application of Brion's verification tools, typically used for design verification in semiconductor manufacturing, to the photomask production process.
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Aug 01, 2006 at 03:18 PM |
 According to the latest Gartner Dataquest review of the semiconductor lithography tool market, Nikon is expected to ship 10, 193nm ArF immersion lithography systems in 2006. The market research firm believes Nikon shipped its first ‘production' tool in 1Q06 as confirmed by Nikon in a press release during SPIE conference at the end of February 2006. Nikon figures for shipments in its first quarter calendar year that started in April 06 was noted for showing no immersion tools being shipped in that period. The company had previously stated that it expected to ship 9 immersion tools for its 2006/7 financial year, indicating that Nikon may well ship more immersion tools than it is currently projecting.Write Comment (0 comments) |
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Lithography 
