SEMATECH, together with its subsidiary, the International SEMATECH Manufacturing Initiative (ISMI), has selected ASML MaskTools to qualify the imaging performance of advanced logic patterns, metrology structures and defect designs for the 45nm through to the 22nm node. This will be done using ASML's TWINSCAN XT:1700i immersion scanner at the company's demo lab facility in Veldhoven, Netherlands.

Taiwan Semiconductor Manufacturing Company (TSMC) has chosen to use Timbre Technologies' (a Tokyo Electron subsidiary) Optical Digital Profilometry - Mask (ODP-M) CD and profile metrology technology for development of advanced 32nm phase-shift masks at its captive mask shop in Taiwan. The technology is being used in conjunction with the Atlas-M Advanced CD and thin-film tool from Nanometrics, the company stated.

Matsushita Electric Industrial Co has selected Mentor Graphics' ‘Calibre' OPCverify tool for RET verification of masks used for production at the 65nm node.
"Verification of post-OPC output is critical to minimizing mask respins of million dollar mask sets, and avoiding time-to-market delays," said Hiroyuki Tsujikawa, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.