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Nov 14, 2006 at 03:49 PM |
 ZMD AG, which specializes in mixed-signal ASICs, has entered into a strategic licensing and consulting agreement with MunEDA regarding MunEDA's DFM-DFY tool WiCkeD. In particular, collaboration will center on ZMD's automotive sensor systems-on-chip for "X-by-Wire" applications, according to MunEDA.
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Nov 13, 2006 at 02:32 PM |
 JMAR Technologies, Inc. has received final notice of non-compliance with minimum bid price requirements and the minimum $2.5 million stockholders' equity levels required by that stock market.
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Nov 03, 2006 at 12:09 PM |
 Cymer, the dominant DUV light source manufacturer for lithography systems, has reached a new milestone with the installation of its 3000th excimer laser light source.
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Oct 26, 2006 at 06:05 PM |
 Rudolph Technologies and Tokyo Electron Limited have streamlined mutual customer communications and business channels with TEL given worldwide distribution rights for Rudolph's integrated lithography inspection technologies, to be included within TEL's coater/developers.Write Comment (0 comments) |
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Oct 24, 2006 at 11:46 PM |
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Cymer Inc. highlighted during its third quarter revenues conference call with financial analysts that it had shipped approximately 30 XLA-300 ArF light sources used specifically for immersion lithography tools in the quarter.Write Comment (0 comments) |
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Oct 18, 2006 at 02:27 PM |
 At the 3rd International Symposium on Immersion Lithography, attendees were more than bullish on 193nm ArF immersion lithography being able to tackle volume production imaging tasks at the 45nm node. More than 20 percent of submitted papers dealt with immersion defects, highlighting the industry's momentum in preparing 193i for volume manufacturing at sub-65nm half-pitch.
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Oct 17, 2006 at 06:11 PM |
 ASML has received its first customer order for a pre-production EUV lithograpy tool that will be shipped in mid-2009 at a cost of approximately 45 million Euros. ASML has recently shipped two Alpha Demo EUV tools to research facilities that would have costs approximately 35 million Euros each.Write Comment (0 comments) |
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Oct 17, 2006 at 05:11 PM |
 Carl Zeiss SMT AG has officially opened the next phase in the building of its lithography optics manufacturing plant in Oberkochen, Germany. In December 2001, the first building phase was officially inaugurated with approximately 150 employees working at the plant. This grew to 1,000 by 2005 and now the company expects to employ approximately 1400 at the 45,000m² facility.
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Oct 10, 2006 at 02:24 PM |
 Following on from a spate of ‘litho-friendly' DFM partnerships, Nikon Corporation and Brion Technologies are to work together on improving computational lithography for the 45nm node.
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Oct 05, 2006 at 04:51 PM |
 SEMATECH North, located within the Albany NanoTech complex, has demonstrated single line pitches of 84nm using Exitech's immersion projection microstepper with 1.3 NA in combination with OPC and other RET techniques.
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Lithography 
