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Mar 15, 2007 at 12:00 AM |
 Product Briefing Outline: KLA-Tencor has launched the ‘TeraScanHR' system, a production-capable 45nm-generation photomask inspection system. The TeraScanHR system features higher imaging resolution and precise database modeling for high defect detection sensitivity and low false detections in both die-to-die and die-to-database modes. The system also has higher-speed image processing for improved productivity, according to the company. KLA-Tencor has already shipped multiple TeraScanHR systems, and has received orders from all leading-edge merchant photomask suppliers, as well as logic, memory and foundry IC manufacturers for 45nm pre-production and 32nm development and demonstration.
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Mar 13, 2007 at 05:31 PM |
 Product Briefing Outline: Brewer Science has introduced an ArF 193nm anti-reflective coating, the ‘ARC 160,' that is designed to enable faster etch and significantly reduce out-gassing during the bake process step. According to Brewer, the new ARC is usable in a wide range of applications such as pre-metal dielectric, hardmask and shallow trench isolation.
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Mar 12, 2007 at 03:25 PM |
 Product Briefing Outline: Vistec Semiconductor Systems has introduced the Vistec LWM9045, a SEM-based Critical Dimension (CD) measurement system for photomask manufacture. The tool was designed specifically to address the needs for 45nm technology node photomask production and 32nm process development cycles.
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Mar 12, 2007 at 11:52 AM |
 Product Briefing Outline: Vistec Semiconductor Systems has launched its next generation mask metrology tool, Vistec LMS IPRO4. This new high-end device is designed to support mask metrology for the 45nm technology node and beyond. The new system is a fully automated mask metrology system, capable to measure registration (overlay on reticles) as well as critical dimensions (CD) in transmitted and in reflected light. Several purchase orders for LMS IPRO4 systems have already been placed by the most advanced captive mask shops in Europe and the US.
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Feb 26, 2007 at 03:57 PM |
 Product Briefing Outline: Timbre Technologies Inc., a Tokyo Electron-owned company, has announced the introduction of their next generation Profiler Application Server, PAS-T4, used to process optical measurements.
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Feb 26, 2007 at 02:14 PM |
 Product Briefing Outline: Brion Technologies has launched ‘Tachyon 2.0,' its second-generation computational lithography platform. Designed for DFM challenges at the 45nm and 32nm nodes, Tachyon 2.0 is claimed to offer a 4x increase in modeling power and a significant increase in the speed of optical proximity correction (OPC) and OPC verification. With improved process-window accuracy and speed, a single Tachyon 2.0 system rack provides the same production capacity as four first generation Tachyon racks, according to the company. Brion will deliver beta Tachyon 2.0 systems in March with midyear volume shipments.
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Feb 26, 2007 at 09:30 AM |
 Product Briefing Outline: KLA-Tencor has updated and improved its PROLITH lithography optimization product with the launch of PROLITH 10. The new upgrades are designed to enable users to accurately predict lithography process windows for
designs down to 32nm. KLA-Tencor claims that with the accuracy of PROLITH 10, customers have already cut costly experimental lithography wafer runs by up to half, as well as dramatically reducing cycle time to production and speeding time to market.
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Jan 05, 2007 at 02:02 PM |
 Product Briefing Outline: Gigaphoton Inc. has launched its newest addition to its argon fluoride (ArF) excimer laser light source portfolio: the GT61A. With an emission wavelength of 193nm and a repetition rate of 6,000 Hz, the GT61A is designed for next-generation lithography tools with numerical apertures of 1.3 and higher. GT61A has already begun shipment, according to the company. Gigaphoton expects the GT61A will be integrated into advanced lithography tools and used within volume production environments at major global semiconductor manufacturers starting mid-2007.
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Nov 29, 2006 at 08:05 PM |
 Product Briefing Outline: Mentor Graphics Corporation has launched ‘Calibre nmOPC,' a third-generation optical proximity correction (OPC) tool for sub-65nm process technologies. Calibre nmOPC tool combined with OPC verification tool, ‘Calibre OPCverify' is designed to provide simulation accuracy with the highest performance and lowest cost of ownership in the industry, according to the company.Write Comment (0 comments) |
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Nov 29, 2006 at 07:00 PM |
 Product Briefing Outline: Tokyo Electron Limited (TEL) will release its new 300mm high productivity coater/developer, ‘CLEAN TRACKT' ‘LITHIUS Pro,' in the fall of 2007. The platform will be intended primarily for immersion lithography applications intended for high volume production environments. The system has been designed to offer dramatically higher productivity and reliability, according to the company.Write Comment (0 comments) |
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Lithography 
