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Materials & Gases Product Briefs
New Product: Alternative to hydroxylamine based resist etch residue remover Print E-mail
May 24, 2006 at 03:38 PM
Baker WaferProduct Briefing Outline: Mallinckrodt Baker has introduced its ‘ALEG-380' photoresist stripper and residue remover as a cost-effective alternative to hydroxylamine-based chemistries in aluminum IC manufacturing processes. ALEG-380 is 100% water-soluble formulation that does not require an intermediate rinse, helping fabs improve yields and reduce manufacturing costs.Write Comment (0 comments)
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New Product: Accent Optical’s new Filmz FTIR offers wide range of plug & play applications. Print E-mail
Nov 08, 2005 at 04:05 PM
Product Briefing Outline: Accent Optical Technologies has expanded its FTIR application suite with the introduction of "Filmz". It employs new proprietary intelligent algorithms to extract the maximum amount of information from the measured IR spectrum, according to the company. The company claims that by directly integrating an interpretive engine within the algorithms dramatically improves the ease of use to the point whereby operators can generate effective recipes.Write Comment (0 comments)
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Internally heated pressure transducer for CVD & etch Print E-mail
Sep 27, 2005 at 11:00 PM
ImageProduct Briefing Outline: Setra Systems, has introduced the 700 Series heated, absolute pressure transducer. The new 700 series incorporates all welded, ‘Inconel' variable capacitance sensors, which are characterized by wide dynamic range, high accuracy and overpressure capability. The ‘Inconel' variable capacitance sensor also provides a direct total pressure measurement that is independent of gas composition.

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Point-of-use filter for subpart per billion levels Print E-mail
Sep 27, 2005 at 10:57 PM
ImageProduct Briefing Outline: Pall Corporation has introduced a new medium to purify the fluorocarbon process gases used in the world's most advanced semiconductor manufacturing facilities. The latest product from its ‘AresKleen' family of point-of-use purification media, the new FCP medium removes molecular contaminants to sub-part per billion levels, helping to improve manufacturing yields in IC devices with features as small as 65nm.Write Comment (0 comments)
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Fine droplet liquid vaporizor system Print E-mail
Sep 27, 2005 at 10:22 PM
ImageProduct Briefing Outline: Emerson Process Management has formed a strategic alliance with MSP Corporation to incorporate Brooks Instrument flow control technologies into the design of the MSP Model 2800 Turbo-Vaporizer. The Model 2800 Turbo-Vaporizer is an enabling technology that has already demonstrated proven performance for depositing hafnium-based high-k dielectric films in commercial DRAM production. Two Brooks mass flow devices in the vaporizer make this capability possible.

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Fab-wide data analysis, storage and retrieval system for wafers Print E-mail
Sep 27, 2005 at 10:17 PM
ImageProduct Briefing Outline: ADE Corporation has introduced the ‘FabVision' system, a real-time, comprehensive, fab-wide data management system that  continuously monitors, reports and manages product quality information. Integration of FabVision has shortened a customer's cycle times and increased process yields, according to the company. Alerts on process excursions, daily reports and selected data are generated and sent automatically worldwide to better manage operations at the fab, process or customer level.Write Comment (0 comments)
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New Product: Air Liquide launches R&D to production advanced precursors Print E-mail
Sep 26, 2005 at 12:00 AM
ImageProduct Briefing Outline: Air Liquide, has created "ALOHA" a dedicated product line and world-wide organization devoted to the development, manufacture and support of advanced precursor materials and delivery systems. ALOHA made its industry-wide debut at the 2005 Semicon West trade show.Write Comment (0 comments)
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High-performance CMP slurry for STI Print E-mail
Feb 04, 2005 at 11:00 PM
ImageProduct Briefing Outline: Hitachi Chemical Co.,has recently developed a highperformance CMP slurry product for STI (Shallow Trench Isolation) that can decrease scratches from polishing by two-thirds and provide a twofold increase of surface flatness over existing products. The company has decided to launch the new product in fullscale production and sales starting January 2005.Write Comment (0 comments)
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Process transparent liquid chemical concentration system Print E-mail
Feb 04, 2005 at 10:00 PM
ImageProduct Briefing Outline: Jetalon Solutions, Inc., has developed a dependable, cost effective, point-of-use system for monitoring and controlling the concentrations of liquid chemicals. The "CR-288" is fully compatible with all liquid chemical manufacturing processes and is currently installed on Chemical-Mechanical  Planarization and Wafer Surface Preparation tools.Write Comment (0 comments)
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New filter for high-flow bulk gas applications Print E-mail
Feb 04, 2005 at 09:00 PM
ImageProduct Briefing Outline: Pall Corporation's Microelectronics Group has extended support to the display and semiconductor markets with a new PTFE-based filter for high-flow, high-purity, bulk gas delivery systems. The new High-Flow "Emflon" Filters enable users to shrink the footprint of their filter systems, resulting in lower capital and operational costs.Write Comment (0 comments)
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